Kaskaskia College Manufacturing Process students recently observed manufacturing processes at Cooper B-Line by Eaton located in Highland
Students observed how B-Line engineers are involved from concept to product launch in tailoring products to new model specifications. Students watched as robots, automation, and in-process quality checks resulted in parts meeting customer needs.
The students also toured the new Research Lab where proud employees are always seeking better ways to improve products. “These tours bring real world learning to the students,” said Professor Rich Rittenhouse, director of the Drafting Program at Kaskaskia College.
“Cooper B-Line is a global provider of innovative, labor-saving support systems and enclosure solutions for engineered facility subsystem applications and part of Cooper Industries plc, operating facilities across the globe. Our products are used in a variety of settings for the commercial, industrial, utility and OEM markets. In addition, Cooper B-Line operates regional sales offices and distribution centers throughout the United States, Korea, the Middle East, Canada and Europe,” according to the Cooper B-Line website, http://www.cooperindustries.com. Cooper B-Line joined the Eaton Corporation in November of 2012.
The Kaskaskia College Computer Drafting program is a flextime, open entry program allowing students to schedule their time during day or evening hours. Students have the advantage of scheduling to a productive level that would allow them to accomplish the program objectives early or to apply additional time to meet the semester ending date. Assignments are completed utilizing "AutoCAD 2014", “Inventor” and Architectural Desktop programs.
Students attending the tour were Brandon Schauwecker of Centralia; Josh Johnson of Irvington; Morjan Engelman of Nashville; Ryan Sherman of Breese; Josh Lappe of Breese; Devin Holle of Hoyleton; Ron Potts of Keyesport; Danny Brown of Salem; Konrad Schaaf of Greenville; and Jason Janson, an employee of B-Line and a KC Drafting graduate.